YELLOW PAGES

VIETNAM BUSINESS DIRECTORY

Search by business name only

Top search: garment company, wood furniture, freight forwarding, agriculture products, packaging manufacturer

Quick search Index Advertise with us Create your free listing

Atomic Layer Deposition Equipment

Place of Origin:

Vietnam

Min. Order:

Contact for details

Delivery time:

Contact for details

Main market:

Vietnam, International

Contact infomation

Contact name: Mr. Ngoc (Eng/Vie)

Mobiphone:+84 988 248 567

Email: phan_ngoc@ulvac.com

Product & service detail

ATOMIC LAYER DEPOSITION EQUIPMENT

1. Outline

- ALD (Atomic Layer Deposition) forms a thin film by repeating cycles of the Atomic Layer Deposition method that forms a single atomic layer in one cycle.
Enabling uniform layer control at an atomic layer level can form a thin film with high quality as well as high step-coverage.
- Application film type : SiO₂, TiO₂, Al₂O₃

2. Main specifications

- 25 pieces of φ4 inch substrates /1 batch

- Rotary mechanism of substrate

- Temperature of substrate heating: 25 to 120 degree C

3. Features

- Excellent film thickness controllability based on single atomic layer-by-layer formation.

- Able to form a film with excellent uniform coverage even for a high aspect-ratio substrate.

- Able to form a film with substrate temperature rise suppressed.

- Excellent film distribution within the substrate surface.

4. Application

- LED (Chroma adjustment, Ag sulfide preventing film)

- Electronic devices (insulation film, barrier metal)